Add:A-4F, Vantone Center, Chaowai St., Chaoyang Dist., Beijing, China.
Tel: +86 10 8599 9168
Cel.: +86 159 0035 7871
E-mail: jackywinn@foxmail.com

Tantalum sputtering targets are widely used in various industries, especially in the semiconductor and electronics industries. They are used in the process of thin film deposition in sputtering equipment. Sputtering is a process where atoms or ions are ejected from a solid target material by a stream of plasma molecules formed in a vacuum chamber. These ejected atoms or ions then deposit onto a substrate to form a thin film layer. Tantalum sputtering targets are used specifically because tantalum has a very high melting point, making it ideal for use in high-temperature environments.
PESCO's Tantalum Sputtering Targets
PETROL STEEL CO, LTD (PESCO) provides a wide selection of purity and shapes of Tantalum sputtering targets to meet the different requirements of customers. Our Tantalum sputtering targets come in different shapes such as cylindrical, rectangular, and planar. We also offer a range of sizes and purities to meet the specific needs of our customers.
Compared to other deposition methods, sputtered films have better adhesion on the substrate, and materials with very high melting points such as tantalum can be easily sputtered. Our products are engineered specifically to perform reliably in the deposition process with small average grain size and high purity & density.
Quality Control
At PESCO, we are dedicated to providing customers with high-quality Tantalum sputtering targets. All of our products are manufactured using only the highest quality raw materials and are subject to rigorous quality control procedures to ensure that our customers receive the best possible products. Our strict quality control measures include visual inspection, high-resolution microscopy, and X-ray diffraction analysis.
If you need Tantalum sputtering targets, look no further than PESCO. We are a leading supplier of high-performance metals at competitive prices, offering a comprehensive selection of Tungsten, Molybdenum, forgings powder metallurgy, and more. Our Tantalum sputtering targets are engineered specifically to perform reliably in the deposition process with high purity & density, making them an ideal choice for your thin film deposition needs. Contact us today to learn more about our products and to place an order
Add:A-4F, Vantone Center, Chaowai St., Chaoyang Dist., Beijing, China.
Tel: +86 10 8599 9168
Cel.: +86 159 0035 7871
E-mail: jackywinn@foxmail.com