Titanium Sputtering Target

Titanium Sputtering Target is a critical coating material used in PVD (Physical Vapor Deposition) processes for semiconductor devices, flat panel displays, optical coatings, data storage media, and decorative surface treatments. The quality of the target directly affects film purity, deposition stability, particle generation, and final coating performance. China Super Tech Co., Ltd. manufactures high-purity titanium targets using vacuum melting, precision forging, and controlled machining processes to ensure homogeneous microstructure, consistent grain distribution, and stable sputtering behavior, helping customers achieve higher coating quality, improved target utilization, and reduced production downtime.

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Product Introduction

Product Introduction

Product Features

1.High Purity for Stable Thin Film Performance
We offer purity levels up to 99.995%, produced from carefully selected titanium raw materials and refined through vacuum melting processes. Lower impurity content minimizes contamination during deposition, which is especially important for semiconductor, optical, and electronic applications requiring high film integrity.

2.Uniform Grain Structure for Consistent Sputtering
Through multiple-stage forging and thermo-mechanical processing, the internal microstructure becomes more homogeneous than conventional cast materials. Uniform grain distribution reduces localized erosion, improves sputtering uniformity, and helps maintain stable deposition rates throughout target life.

3.Low Particle Generation
Surface defects and microstructural inconsistencies are common causes of particle formation during sputtering. Our precision machining and surface finishing processes reduce defect density, helping customers lower particle contamination and improve production yield.

4.Strong Bonding Reliability
For bonded targets, we use controlled bonding technologies and strict interface inspection procedures to achieve excellent thermal conductivity and heat dissipation. This helps reduce thermal stress during high-power sputtering operations and extends target service life.

5.High Material Utilization
Optimized dimensional accuracy and uniform erosion characteristics allow more efficient target consumption before replacement, reducing overall coating costs and improving equipment uptime.

Applications

1.Semiconductor Manufacturing
Titanium films are widely used as adhesion layers and barrier layers in integrated circuits. High-purity targets help reduce impurity-related defects, while uniform sputtering behavior supports precise film thickness control required for advanced semiconductor fabrication.

2.Optical Coatings
Titanium-based coatings are used in lenses, filters, and optical components. Stable target composition contributes to consistent optical properties, including reflectivity, transmission, and refractive index control across large production batches.

3.Flat Panel Display Production
Display manufacturers require uniform coatings over large substrate areas. Homogeneous target microstructures support even film deposition, helping improve display consistency and reduce coating variation across panels.

4.Data Storage Media
Magnetic storage devices depend on highly controlled thin-film structures. High-density and low-defect targets contribute to better film quality and enhanced recording performance.

5.Decorative and Functional Coatings
Titanium coatings provide wear resistance, corrosion resistance, and attractive surface finishes. Consistent sputtering performance ensures uniform color appearance and coating thickness for consumer and industrial products.

Custom Manufacturing Services

1.Customized Purity Levels
China Super Tech Co., Ltd. can supply various purity grades according to coating process requirements, balancing performance objectives and project budgets.

2.Flexible Dimensions and Shapes
Available in round, rectangular, rotary, planar, and customer-designed geometries. Precision machining capabilities allow tight dimensional tolerances for compatibility with major sputtering systems.

3.Bonded and Backing Plate Solutions
We provide complete bonded target assemblies with customized backing plate materials and configurations to match specific equipment requirements.

4.Controlled Grain Structure Engineering
Unlike suppliers that only focus on chemistry, we optimize forging reduction ratios and thermal treatment parameters to achieve controlled grain structures that improve sputtering uniformity and target utilization.

5.Complete Quality Documentation
Available documentation includes chemical composition reports, dimensional inspection records, ultrasonic testing reports, material certificates, and customized quality requirements for semiconductor and electronics industries.

Specifications

Parameter	Specification
Material	Pure Titanium
Purity	99.5% – 99.995%
Manufacturing Process	Vacuum Melting + Forging + Precision Machining
Shape Options	Round, Rectangular, Rotary, Custom
Density	≥99% Theoretical Density
Grain Structure	Fine and Uniform
Surface Finish	Precision Machined
Bonding Option	Indium Bonding / Elastomer Bonding / Customized
Diameter Range	Up to 500 mm
Length Range	Customized
Thickness Range	Customized
Dimensional Tolerance	According to Customer Requirements
Inspection Methods	Chemical Analysis, UT Testing, Dimensional Inspection
Compliance	ASTM B265 and Customer Specifications

FAQ

1.Why is target purity important?

Impurities can be transferred into deposited films during sputtering. Higher purity targets reduce contamination risks, improve film quality, and are particularly important for semiconductor, optical, and electronic applications where performance depends on material cleanliness.

2.How does grain structure affect sputtering performance?

Non-uniform grains can cause uneven erosion and unstable deposition rates. A refined and homogeneous grain structure helps achieve more consistent sputtering behavior, better coating uniformity, and higher target utilization.

3.Do you provide bonded sputtering targets?

Yes. China Super Tech Co., Ltd. supplies both monolithic and bonded products. Bonded assemblies can improve heat transfer efficiency and support high-power sputtering processes.

4.Can you manufacture according to our equipment drawings?

Yes. We regularly produce custom dimensions, special shapes, mounting configurations, and backing plate assemblies based on customer drawings and sputtering system requirements.

5.What quality inspections are performed before shipment?

Each order can undergo chemical composition verification, dimensional inspection, surface examination, ultrasonic testing, and other customer-specified quality checks to ensure compliance with project requirements.

6.What industries typically use this product?

Common industries include semiconductor fabrication, display manufacturing, optical coating, solar energy, data storage, aerospace coatings, and decorative PVD coating applications.

7.How do you ensure batch-to-batch consistency?

We maintain strict control over raw material sourcing, vacuum melting parameters, forging processes, heat treatment conditions, machining accuracy, and final inspection procedures. This integrated manufacturing approach helps deliver consistent performance across production batches.

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